Process for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1h-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde

ABSTRACT

Disclosed herein are processes for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde (also referred to herein as Compound (I)) and intermediates used in such processes. Compound (I) binds to hemoglobin and increases it oxygen affinity and hence can be useful for the treatment of diseases such as sickle cell disease.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to U.S. Provisional Patent ApplicationNo. 62/335,583, filed May 12, 2016, which is incorporated herein byreference in its entirety and for all purposes.

FIELD

Disclosed herein are processes for synthesizing2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde(Compound (I)) and intermediates used in such processes. Compound (I)binds to hemoglobin and increases it oxygen affinity and hence can beuseful for the treatment of diseases such as sickle cell disease.

BACKGROUND

Compound (I) is disclosed in Example 17 of the International PublicationNo. WO2013/102142. Compound (I) binds to hemoglobin and increases itoxygen affinity and hence can be useful for the treatment of diseasessuch as sickle cell disease.

In general, for a compound to be suitable as a therapeutic agent or partof a therapeutic agent, the compound synthesis must be amendable tolarge scale manufacturing and isolation. The large scale manufacturingand isolation should not impact the physical properties and purity ofthe compound nor should it negatively impact cost or efficacy of aformulated active ingredient. Accordingly, scale up of manufacturing andisolation may require significant efforts to meet these goals.

SUMMARY

Compound (I) has been synthesized by certain methods starting with2,6-dihydroxbenzaldehyde (compound 1) where each hydroxyl moiety isprotected with an unbranched, straight-chain alkyl or alkoxyalkyl suchas, for example, methyl or methoxymethyl. Following installation of thealdehyde group, various methods of deprotection of the hydroxyl groupwere employed to synthesize compound (1) used in the synthesis andproduction of Compound (I). However, the deprotection processes usedlead to unwanted polymerization and decomposition reactions of compound(1)—attributed, in part, to the conditions used for deprotection of thehydroxy groups. The undesired byproducts yield complex mixtures, loweryields of Compound (I), and require significant effort to purifyCompound (I) to a degree acceptable for use as a part of a therapeuticagent, thus rendering the above processes impractical for commercialscale synthesis of Compound (I).

Provided herein are processes for the synthesis of Compound (I):

that employ a protecting group sequence and mild reaction conditions toobtain compound (1) in a manner that suppresses unwanted polymerizationand decomposition reactions and enables commercial scale synthesis ofCompound (I).

In one aspect, provided is a process of synthesizing compound (1):

the process comprising:

Step (i): treating a compound of formula (2):

where each R is —CH(CH₂R¹)—OR² or tetrahydropyran-2-yl optionallysubstituted with one, two, or three alkyl with an acid to provide acompound (1) and wherein R¹ is hydrogen or alkyl and R² is alkyl;

Step (ii): optionally converting compound (1) to Compound (I):

by reacting compound (1) with a compound of formula (3):

where LG is a leaving group under alkylation reacting conditions; and

Step (iii): optionally crystallizing Compound (I) from heptane andmethyl tert-butyl ether at 40°+/−5° C. to 55+/−5° C., preferably at45°+/−5° C. to 55+/−5° C.

Further provided herein is a process for synthesizing Compound (I), theprocess comprising performing Steps (i) and (ii) of the first aspect insequence, including embodiments and subembodiments of aspect 1 describedherein, thereby synthesizing Compound (I). Further provided herein is aprocess for synthesizing Compound (I), the process comprising performingSteps (i), (ii), and (iii) of the first aspect in sequence, includingembodiments and subembodiments of aspect 1 described herein, therebyobtaining Compound (I).

Provided herein in a second aspect, is a process of synthesizing acompound of formula (2):

the process comprising formylating a compound of formula (4):

wherein each R in compounds of formulae (2) and (4) is —CH(CH₂R¹)—OR²(where R¹ is hydrogen or alkyl and R² is alkyl) or tetrahydropyran-2-yloptionally substituted with one, two, or three alkyl to provide acompound of formula (2) above.

Provided herein in a third aspect, is a process of synthesizing acompound of formula (4):

wherein each R is —CH(CH₂R¹)—OR² (wherein R¹ is hydrogen or alkyl and R²is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two,or three alkyl, the process comprising: reacting compound (5):

with a vinyl ether of formula CHR¹═CHOR² (wherein R¹ is hydrogen oralkyl and R² is alkyl) or 3,4-dihydro-2H-pyran optionally substitutedwith one, two or three alkyl, in the presence of a weak acid to providea compound of formula (4) above.

Provided in a fourth aspect is a process of synthesizing compound (1):

wherein each R is —CH(CH₂R¹)—OR² (where R¹ is hydrogen or alkyl and R²is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two,or three alkyl, the process comprising:

Step (a): reacting compound (5):

with a vinyl ether of formula CHR¹═CHOR² (wherein R¹ is hydrogen oralkyl and R² is alkyl) or 3,4-dihydro-2H-pyran optionally substitutedwith one, two or three alkyl, in the presence of a weak acid to providea compound of formula (4):

wherein each R is —CH(CH₂R¹)—OR² (where R¹ is hydrogen or alkyl and R²is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two,or three alkyl;

Step (b): treating compound (4) in situ with a formylating agent toprovide a compound of formula (2):

Step (c): treating the compound of formula (2) in situ with an acid toprovide compound (1) above;

Step (d): optionally converting compound (1) to Compound (I):

by reacting compound (1) with a compound of formula (3)

where LG is a leaving group under alkylation reacting conditions; and

Step (e): optionally crystallizing Compound (I) from heptane and methyltert-butyl ether at 40°+/−5° C. to 55+/−5° C., preferably at 45°+/−5° C.to 55+/−5° C.

Further provided herein is a process of synthesizing Compound (I), theprocess comprising performing Steps (a), (b), and (c) or (b) and (c) ofthe fourth aspect in sequence, including embodiments and subembodimentsof aspect 4 described herein. Further provided herein is a process ofsynthesizing Compound (I), the process comprising performing Steps (a),(b), (c), and (d), or (b), (c), and (d) of the fourth aspect insequence, including embodiments and subembodiments of aspect 4 describedherein. Further provided herein is a process of synthesizing Compound(I), the process comprising performing Steps (a), (b), (c), (d), and(e), or (b), (c), and (d) and (e) of the fourth aspect in sequence,including embodiments and subembodiments of aspect 4 described herein.In one embodiment, the first and fourth aspects further includesynthesizing compound (3) from the intermediate compound (6) as providedin the seventh aspect described herein.

Further provided herein in a fifth aspect is an intermediate of thecompound of formula (4):

where each R is tetrahydropyran-2-yl optionally substituted with one,two, or three alkyl.

In a sixth aspect, provided is an intermediate of formula (2):

where each R is —CH(CH₂R¹)—OR² (wherein R¹ is hydrogen or alkyl and R²is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two,or three alkyl.

In a seventh aspect, provided is a process of synthesizing compound (6):

the process comprising reacting a boronic acid compound of formula:

where R³ and R⁴ are independently alkyl or together form —(CR′R″)₂ whereR′ and R″ are independently alkyl; with

where X is halo or triflate, in the presence of a palladium catalyst anda base in an organic/aqueous reaction mixture. Compound (6) can be usedin the synthesis of Compound (3) as described herein.

The above aspects can be understood more fully by reference to thedetailed description and examples below, which are intended to exemplifynon-limiting embodiments.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is a XRPD pattern for crystalline Form I of Compound (I).

FIG. 2 is a XRPD pattern for crystalline Form II of Compound (I).

DETAILED DESCRIPTION

Unless otherwise stated, the following terms as used in thespecification and claims are defined for the purposes of thisApplication and have the following meaning:

“Alkyl” means a linear saturated monovalent hydrocarbon radical of oneto six carbon atoms or a branched saturated monovalent hydrocarbonradical of three to six carbon atoms, e.g., methyl, ethyl, propyl,2-propyl, butyl, pentyl, and the like.

“Optional” or “optionally” means that the subsequently described eventor circumstance may but need not occur, and that the descriptionincludes instances where the event or circumstance occurs and instancesin which it does not. For example, “optionally crystallizing Compound(I) from heptane and methyl tert-butyl ethyl” means that thecrystallization may but need not be done.

“About” as used herein means that a given amount or range includesdeviations in range or amount that fall within experimental error unlessindicated otherwise.

“Substantially pure” as used herein in connection with the polymorphicform refers to a compound such as Compound (I) wherein at least 70% byweight of the compound is present as the given polymorphic form. Forexample, the phrase “Compound (I) is substantially pure Form I or II”refers to a solid state form of Compound (I) wherein at least 70% byweight of Compound (I) is in Form I or II respectively. In oneembodiment, at least 80% by weight of Compound (I) is in Form I or IIrespectively. In another embodiment, at least 85% by weight of Compound(I) is in Form I or II respectively. In yet another embodiment, at least90% by weight of Compound (I) is in Form I or II respectively. In yetanother embodiment, at least 95% by weight of Compound (I) is in Form Ior II respectively. In yet another embodiment, at least 99% by weight ofCompound (I) is in Form I or II respectively.

EMBODIMENTS

(a) In embodiment (a), the process of the first aspect further comprisesformylating a compound of formula (4):

wherein each R is —CH(CH₂R¹)—OR² wherein R¹ is hydrogen or alkyl and R²is alkyl or R is tetrahydropyran-2-yl optionally substituted with one,two, or three alkyl to provide a compound of formula (2).

In a first subembodiment of embodiment (a), each R is the same. In asecond subembodiment, the tetrahydropyran-2-yl moiety is unsubstituted.In a third subembodiment of embodiment (a), the tetrahydropyran-2-ylmoiety is substituted with one, two, or three alkyl.

(b) In embodiment (b) the process of embodiment (a) further comprisesreacting compound (5):

with a vinyl ether of formula CHR¹═CHOR², where R¹ is hydrogen or alkyland R² is alkyl) or 3,4-dihydro-2H-pyran optionally substituted withone, two or three alkyl, in the presence of a weak acid to provide acompound of formula (4):

wherein each R is —CH(CH₂R¹)—OR² (where R¹ is hydrogen or alkyl and R²is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two,or three alkyl.

In one subembodiment of embodiment (b), the 3,4-dihydro-2H-pyran moietyis unsubstituted. In another subembodiment of embodiment (b), the3,4-dihydro-2H-pyran moiety is substituted with one, two or three alkyl.

(c) In embodiment (c), the process of the first aspect, Step (i), fourthaspect, Step (c), and embodiments (a) and (b) is wherein the acid usedin the removal of R group is an organic or inorganic acid. In a firstsubembodiment of embodiment (c), the acid is hydrochloric acid, sulfuricacid, trifluoroacetic acid, methanesulfonic acid, or ethanesulfonicacid. In a second subembodiment of embodiment (c), the acid ishydrochloric acid. In a third subembodiment of embodiment (c), includingsubembodiments and embodiments contained therein, the reaction isperformed at a pH of less than about: 4, 3, 2, or 1. In a fourthsubembodiment of embodiment (c), including subembodiments andembodiments contained therein, the reaction is performed at a pH ofabout 1 to about 3. In a fifth subembodiment of embodiment (c),including subembodiments and embodiments contained therein, the reactionis performed at a pH greater than 1. In a sixth subembodiment ofembodiment (c), including subembodiments and embodiments containedtherein, the reaction is performed at a pH less than 1. In a seventhsubembodiment of embodiment (c), including subembodiments andembodiments contained therein, the compound (2) is treated in-situ withthe organic or inorganic acid to synthesize compound (1). In an eightsubembodiment of embodiment (c), including subembodiments andembodiments contained therein, the reaction is carried out in an organicsolvent such as tetrahydrofuran, methyl tetrahydrofuran, ethyl ether, ordioxane. In a ninth subembodiment of embodiment (c), includingsubembodiments and embodiments contained therein, the reaction iscarried out in an organic solvent such as tetrahydrofuran. In a tenthsubembodiment of embodiment (c), including subembodiments andembodiments contained therein, the reaction is carried out attemperatures less than 30° C.+/−5° C., preferably the reaction iscarried out at temperatures less than about 20° C. In an eleventhsubembodiment of embodiment (c), including subembodiments andembodiments contained therein, the deprotection is performed in ashorter amount of time than previous synthetic routes. The shorteneddeprotection time can reduce polymerization or decomposition of theintermediate compound (1) and/or, (2) as described herein.

(d) In embodiment (d), the process of the first and fourth aspects,embodiments (a), (b) and (c) and subembodiments contained therein, iswherein LG is chloro, bromo, tosylate, mesylate, or triflate. LG canpreferably be chloro. In a first subembodiment of embodiment (d), LG ischloro and the reaction is carried out in the presence of anon-nucleophilic organic base (such as pyridine, trimethylamine,N-methyl-2-pyrrolidone, and diisopropylethylamine in the presence of aweak inorganic base such as sodium bicarbonate, potassium bicarbonate,cesium carbonate, and the like). In a second subembodiment of embodiment(d), the weak inorganic base is sodium bicarbonate. In a thirdsubembodiment of embodiment (d), LG is chloro and the reaction iscarried out in the presence of pyridine and a weak inorganic base suchas sodium bicarbonate. In a fourth subembodiment of embodiment (d) andsubembodiments and embodiments contained therein, the reaction iscarried out in N-methyl-2-pyrrolidinone. In a fifth subembodiment ofembodiment (d), LG is chloro and the reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate andcatalytic amount of NaI. In a sixth sub-embodiment of the embodiment (d)and sub-embodiments contained therein, the reaction is carried out atbetween 40° C. to 50° C. In a seventh sub-embodiment of the embodiment(d) and sub-embodiments contained therein, the reaction is carried outat between 43° C. to 45° C. In an eight sub-embodiment of the embodiment(d) and sub-embodiments contained therein, after the reaction iscomplete, the reaction mixture is treated with water and then seededwith Compound (I) Form I at 40° C. to 50° C., preferably 40° to 46° C.to give Compound (I) as substantially pure Form I, preferably Compound(I) is at least 95% by weight pure Form I.

(e) In embodiment (e), the process of the first aspect, Step (iii),fourth aspect Step (e) and embodiments (a), (b), (c) and (d) andsubembodiments contained therein is wherein, the crystallization ofCompound (I) is carried out at 45+/−5° C. to 55+/−5° C. or at 45° C. to55° C., and the solvent is n-heptane and methyl tert-butyl ether toprovide substantially pure Compound (I) Form II. In one embodiment, atleast 95% by wt of Compound (I) is Form II. In one embodiment, at least98% by wt of Compound (I) is Form II. In one embodiment, at least 99% bywt of Compound (I) is Form II.

(f) In embodiment (f), the process of the first, second, third, fourth,fifth, and sixth aspects, embodiments (a)-(e), and subembodimentscontained therein is wherein, each R is —CH(CH₃)—O—CH₂CH₃,—CH(C₂H₅)—O—CH₂CH₃. In one subembodiment of (g), each R is—CH(CH₃)—O—CH₂CH₃.

(g) In embodiment (g), the process of the first, second, third, fourth,fifth, and sixth aspects, embodiments (a)-(e), and subembodimentscontained therein is wherein, each R is tetrahydropyran-2-yl optionallysubstituted with one or two methyl. In a first subembodiment of (g), Ris tetrahydrofuran-2-yl. In a second subembodiment of (g), each R istetrahydropyran-2-yl is substituted with one methyl.

(h) In embodiment (h), the process of the third and fourth aspects,embodiments (a)-(e), and subembodiments contained therein is wherein,the acid used in the conversion of compound (5) to the compound offormula (4) is a weak acid such as p-toluenesulfonic acid or pyridiniumtosylate. In a first subembodiment of embodiment (h), the acid ispyridinium tosylate.

(i) In embodiment (i) the process of second aspect and fourth aspect,Step (b), embodiments (a)-(i) and subembodiments contained therein, iswherein the formylating agent is n-BuLi and DMF, or n-formylmorpholine.In a first subembodiment of embodiment (i), the formylating agent isn-BuLi and DMF. In a second subembodiment of embodiment (i), includingthe first subembodiment of embodiment (i), the reaction is carried outin THF.

(j) In embodiment (j) the process of the seventh aspect, is wherein thepalladium catalyst isdichloro[1,1′-bis(diphenylphosphino)ferrocene]palladium(II) or itsdichloromethane adduct. In a first subembodiment of embodiment (j), R³and R⁴ together form —C(CH₃)₂—C(CH₃)₂— and X is halo. In a secondsubembodiment of embodiment (j), including the first subembodiment ofembodiment (j), R³ and R⁴ together form —C(CH₃)₂—C(CH₃)₂— and X ischloro.

(k) In embodiment (j) the intermediate of the fifth and sixth aspects iswherein each R is —CH(CH₃)—O—CH₂CH₃.

(l) In embodiment (1) the intermediate of the fifth and sixth aspects iswherein, each R is tetrahydropyran-2-yl.

Form I of Compound (I) can be characterized by a XRPD pattern comprisingX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.94°, 15.82°, 16.11°, 16.74°, 17.67°, 25.19°, 25.93° and 26.48°±0.2°20. In one embodiment, Form I of Compound (I) is characterized by anX-ray powder diffraction pattern (Cu Kα radiation) substantially similarto that of FIG. 1. In another embodiment, the Form I of the free base ofCompound (I) is characterized by a XRPD pattern comprising at least twoX-ray powder diffraction peaks (Cu Kα radiation) selected from 12.94°,15.82°, 16.11°, 16.74°, 17.67°, 25.19°, 25.93° and 26.48° (each ±0.2°20). In another embodiment, the Form I of Compound (I) is characterizedby a XRPD pattern comprising at least three X-ray powder diffractionpeaks (Cu Kα radiation) selected from 12.94°, 15.82°, 16.110, 16.74°,17.67°, 25.19°, 25.93° and 26.48° (each ±0.2° 2θ). In anotherembodiment, Form I is characterized by a XRPD pattern comprising 1, 2,3, 4, or more peaks as tabulated below in Table 1 that lists the XRPDpeak positions and relative intensities of major XRPD peaks for Form Iof Compound (I).

TABLE 1 XRPD peaks for Form I of Compound (I). °2θ d space (Å) Intensity(%)  5.51 ± 0.20 16.045 31.1  5.63 ± 0.20 15.696 35.5 11.17 ± 0.20 7.9232.05 12.94 ± 0.20 6.841 3.7 15.09 ± 0.20 5.870 9.8 15.82 ± 0.20 5.6002.3 16.11 ± 0.20 5.500 4.0 16.74 ± 0.20 5.295 100 17.67 ± 0.20 5.0184.01 18.81 ± 0.20 4.716 2.8 19.13 ± 0.20 4.639 0.9 19.38 ± 0.20 4.5811.0 20.41 ± 0.20 4.350 3.4 21.00 ± 0.20 4.230 2.9 21.72 ± 0.20 4.092 2.222.36 ± 0.20 3.976 10.6 22.86 ± 0.20 3.890 1.7 23.30 ± 0.20 3.817 1.225.19 ± 0.20 3.54 7.9 25.33 ± 0.20 3.516 19.1 25.93 ± 0.20 3.436 8.726.48 ± 0.20 3.366 3.6 28.01 ± 0.20 3.185 24.8 28.27 ± 0.20 3.157 1.49

Form II of Compound (I) can be characterized by a XRPD patterncomprising a X-ray powder diffraction peak (Cu Kα radiation at one ormore of 13.44°, 14.43°, 19.76°, 23.97°±0.2° 2θ. In another embodiment,Form II of Compound (I) is characterized by a XRPD pattern comprising aX-ray powder diffraction pattern (Cu Kα radiation) substantially similarto that of FIG. 2. In another embodiment, Form II of Compound (I) ischaracterized by a XRPD pattern comprising at least two X-ray powderdiffraction peak (Cu Kα radiation) selected from 13.44°, 14.43°, 19.76°,23.97° 20 (each ±0.2° 2θ). In another embodiment, Form II of Compound(I) is characterized by a XRPD pattern comprising at least three X-raypowder diffraction peaks (Cu Kα radiation) selected from 13.44°, 14.43°,19.76°, and 23.97° 20 (each ±0.2° 2θ). In another embodiment, Form II ofCompound (I) is characterized by a XRPD pattern comprising X-ray powderdiffraction peaks (Cu Kα radiation) selected from 13.44°, 14.43°,19.76°, and 23.97° 20 (each ±0.2° 2θ).

In another embodiment, Form II is characterized by 1, 2, 3, 4, or morepeaks as tabulated below in Table 2 that lists the XRPD peak positionsand relative intensities of major XRPD peaks for Form II of Compound(I).

TABLE 2 Major XRPD peaks for Form II of Compound (I). °2θ d space (Å)Intensity (%)  5.70 ± 0.20 15.494 24.8  9.64 ± 0.20 9.172 5.4 11.32 ±0.20 7.812 12.2 11.52 ± 0.20 7.680 12.2 12.66 ± 0.20 6.992 10.3 12.90 ±0.20 6.861 16.4 13.44 ± 0.20 6.587 28.5 14.43 ± 0.20 6.137 28.7 14.79 ±0.20 5.991 18.3 15.38 ± 0.20 5.761 17.5 16.18 ± 0.20 5.477 16.4 16.51 ±0.20 5.370 72.3 17.04 ± 0.20 5.205 100 18.56 ± 0.20 4.781 71.1 20.01 ±0.20 4.437 22.5 20.31 ± 0.20 4.373 7.7 23.06 ± 0.20 3.858 16.3 23.97 ±0.20 3.712 19.7 24.46 ± 0.20 3.639 34.1 25.06 ± 0.20 3.554 53.6 25.45 ±0.20 3.500 88.0 26.29 ± 0.20 3.390 23.5 26.78 ± 0.20 3.329 12.6 27.07 ±0.20 3.294 26.2 27.49 ± 0.20 3.245 5.4 28.09 ± 0.20 3.176 15.6 28.54 ±0.20 3.128 13.44

The processes described herein can be used for synthesizing Compound (I)at a manufacturing scale synthesis (e.g., at least 0.05, 0.1, 0.2, 0.3,0.4, 0.5, 1, 2, 3, 4, 5, 10, 20, 25, 50, 100, or more kg amounts). Theprocesses described herein can be useful for larger scale syntheses(e.g., at least 0.05, 0.1, 0.2, 0.3, 0.4, 0.5, 1, 2, 3, 4, 5, 10, 20,25, 50, 100, or more kg amounts) which retain the physical properties,purity, efficacy, a combination thereof, or all thereof, of Compound(I).

The processes described herein surprisingly reduce polymerization ofcompound (1) and surprisingly reduce polymerization intermediates duringthe synthesis of Compound (I). In one embodiment, the polymerization canbe reduced by at least 5%, 10%, 20%, 25%, 50%, 75%, 80%, 90%, 95% ormore compared to previous synthesis routes as described herein.

The processes described herein surprisingly reduce decompositionreactions during the synthesis of (and deprotection of) compound (1).The decomposition reactions can be reduced by at least 5%, 10%, 20%,25%, 50%, 75%, 80%, 90%, 95% or more compared to previous synthesisroutes as described herein. The processes described herein can increasethe purity of the final product of Compound (I) by at least 5%, 10%,20%, 25%, 50%, 75%, 80%, 90%, 95%, 97%, 99% or more compared to previoussynthesis routes as described herein.

XRPD Analysis:

XRPD patterns were collected with a PANalytical X'Pert3 X-ray PowderDiffractometer using an incident beam of Cu Kα radiation (Kα1 (Å):1.540598, Kα2 (Å): 1.544426 Kα2/Kα1 intensity ratio: 0.50, tube settingat 45 kV, 40 mA). A continuous scan mode between 3 and 40 (020) with ascan speed of 50 s per step and a step size of 0.0263 (° 20) inreflection mode was used. The diffractometer was configured using thesymmetric Bragg-Brentano geometry. Data collection used Data CollectorVersion® 4.3.0.161 and Highscore Plus® version 3.0.0.

EXAMPLES Example 1 Synthesis of 2,6-dihydroxybenzaldehyde (Compound (1))

Step 1:

Tetrahydrofuran (700 mL) was added to resorcinol (170 g, 1.54 mol, 1eq.) under inert gas protection, followed by addition of pyridiniumtosylate (3.9 g, 15.4 mmol, 0.01 eq.), THF 65 mL) and the reactionmixture was cooled down to 0-5° C. Within 1-1.5 h ethylvinyl ether (444mL, 4.63 mol, 3.0 eq.) was added while maintaining a temperature ≦5° C.After the addition was complete the reaction mixture was allowed toreach room temperature within 1.5 h. The reaction was stirred overnight,cooled down to 10-15° C., and 510 mL of ½ sat. NaHCO₃ was added whilemaintaining the reaction solution below 20° C. The phases wereseparated. The organic phase was washed once with 425 mL of water andonce with 425 mL 12.5% NaCl solution and evaporated and azeotroped withTHF to give bis-EOE-protected resorcinol (401.2 g, 1.55 mol, 102%uncorrected) as a clear colorless to yellowish oil.

Step 2:

Bis-EOE-protected resorcinol (390 g of, actual: 398.6 g=1.53 mol, 1 eq.,corrected to 100% conversion) was added under inert gas protection to a6 L glass vessel and THF (1170 mL) was added. The reaction mixture wascooled down to −10° C. to −5° C. and n-BuLi (625 mL, 2.7 M in heptane,1.687 mol, 1.1 eq.) was added. The reaction mixture was agitated at −5°C.-0° C. for 30-40 min and then DMF (153.4 mL, 1.99 mmol, 1.3 eq.) wasadded starting at −10° C. to −5° C. The reaction mixture was stirreduntil complete and then quenched with 1N HCl/EtOAc. It was alsodiscovered, inter alia, that protection with the EOE groups not onlyresulted in less byproducts but appeared to increase the speed of theformylation reaction to provide 2,6-bis(1-ethoxyethoxy)benzaldehyde(compound (2)).

The mixture was worked up, phase separated and the aqueous washed withMTBE. After aqueous wash to remove salts the organic phase wasconcentrated to the neat oil to obtain the compound (2) as yellow oil(almost quantitative).

A batch preparation was performed using solvent swap and was completedfaster than other known methods for synthesizing Compound (I) withbetter purity and yield. The deprotection sequence allowed in-situ useof compound (2).

Step 3:

To the reaction solution of Step 2 was added 1N HCl (1755 mL) whilemaintaining the temperature <20° C. The pH was of the solution wasadjusted to pH=0.7-0.8 with 6 M HCl. The reaction mixture was stirredfor 16 h. After the reaction was complete the organic phase wasseparated and 1560 mL of methyl tert butyl ether was added. The organicphase was washed once with 1170 mL of 1N HCl, once with 780 mL of ½ sat.NaCl solution and once with 780 mL of water and then concentrated to avolume of ˜280 mL. To the solution was added 780 mL of methyl tert butylether and concentrate again to 280 mL [temperature <45° C., vacuo]. Tothe slurry was added 780 mL of acetonitrile and the solution wasconcentrated in vacuo at T<45° C. to a final volume of ˜280 mL. Theslurry was heated to re-dissolve the solids. The solution was cooledslowly to RT and seeded at 60-65° C. to initiate crystallization of theproduct. The slurry was cooled down to −20° C. to −15° C. and agitatedat this temperature for 1-2 h. The product was isolated by filtrationand washed with DCM (pre-cooled to −20° C. to −15° C.) and dried under astream of nitrogen to give 2,6-dihydroxybenzaldehyde as a yellow solid.Yield: 138.9 g (1.00 mol, 65.6%).

Example 1A Alternate Synthesis of 2,6-dihydroxybenzaldehyde compound (1)

Step 1:

In a suitable reactor under nitrogen, tetrahydrofuran (207 L) was addedto resorcinol (46 kg, 0.42 kmol, 1 eq.) followed by addition ofpyridinium tosylate (1.05 kg, 4.2 mol, 0.01 eq.), and the reactionmixture was cooled down to 0-5° C. Within 1-1.5 h ethylvinyl ether (90.4kg, 120.5 L, 125 kmol, 3.0 eq.) was added while maintaining atemperature <5° C. After the addition was complete the reaction mixturewas allowed to reach room temperature within 1.5 h. The reaction wasstirred overnight, cooled down to 10-15° C., and 138 L of aqueous 4%NaHCO₃ was added while maintaining the reaction solution below 20° C.The phases were separated. The organic phase was washed once with 115 Lof water and once with 125.2 kg of a 12.5% NaCl solution. The organiclayer was dried by azeotropic distillation with THF to a water contentvalue <0.05% (by weight) to yield bis-EOE-protected resorcinol (106.2kg, 0.42 kmol) as a solution in THF. An advantage over previouslyreported protection procedures is that the bis-EOE-protected resorcinolproduct does not need to be isolated as a neat product. Theproduct-containing THF solution can be used directly in the nextreaction step thus increasing throughput and reducing impurityformation.

Step 2:

Bis-EOE-protected resorcinol solution (assumption is 100% conversion)was added under inert gas protection to suitable reactor. The reactionmixture was cooled down to −10° C. to −5° C. and n-BuLi (117.8 kg, 25%in heptane, 1.1 eq.) was added. The reaction mixture was agitated at −5°C.-0° C. for 30-40 min and then DMF (39.7 kg, 0.54 kmol, 1.3 eq.) wasadded at −10° C. to −5° C. The reaction mixture was stirred untilcomplete and then quenched with aqueous HCl (1M, 488.8 kg) to give2,6-bis(1-ethoxyethoxy)benzaldehyde. An advantage over previouslyreported procedures of using EOE protecting group is that the HClquenched solution can be used directly in the deprotection step, and2,6-bis(1-ethoxyethoxy)benzaldehyde does not need to be isolated as aneat oil.

Step 3:

The pH of the quenched solution was adjusted to <1 with aqueous HCl (6M,ca 95.9 kg) and the reaction mixture stirred at ambient temperature for16 h. After the reaction was complete the organic phase was separatedand 279.7 kg of methyl tert butyl ether was added. The organic phase waswashed once with aqueous 1N HCl (299 kg), once with aqueous 12.5% NaCl(205.8 kg) and once with 189 kg of water and then concentrated to avolume of ca. 69 L. To the slurry was added 164 kg of acetonitrile andthe solution was concentrated in vacuo at T<45° C. to a final volume ofca. 69 L. The slurry was heated to re-dissolve the solids. The solutionwas seeded at 60-65° C. to initiate crystallization of the product andcooled slowly to RT over 8 hrs. The slurry was cooled down to −20° C. to−15° C. and agitated at this temperature for 1-2 h. The product wasisolated by filtration and washed with DCM (50.3 kg, pre-cooled to −20°C. to −15° C.) and dried under a stream of nitrogen to yield2,6-dihydroxybenzaldehyde as a yellow solid. Yield: 37.8 kg (0.27 kmol,65.4% Yield). The described telescoped approach from deprotection tocrystallization increases the throughput and integrity of the product.

Example 2 Synthesis of3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine dihydrochloridesalt

Step 1:

An appropriately sized flask was purged with nitrogen and charged with(2-chloropyridin-3-yl)methanol (1.0 equiv), sodium bicarbonate (3.0equiv), [1, 1′-bis(diphenyl-phosphino)-ferrocene]dichloropalladium (5mol %),1-isopropyl-5-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)-1H-pyrazole(1.2 equiv), and a mixture of 2-MeTHF (17.4 vol) and deionized water(5.2 vol). The resulting solution was heated to 70° C. to 75° C. andconversion monitored by HPLC. Once the reaction was complete, thereaction mixture was cooled to room temperature, diluted with deionizedwater, and the phases were separated. The organic layer was extractedwith 2 N HCl (10 vol) and the phases were separated. The aqueous phasewas washed with MTBE. The pH of the aqueous phase was adjusted to 8-9with 6 N NaOH. The product was extracted into EtOAc, treated with DarcoG-60 for 30 to 60 min, dried over MgSO₄, filtered through Celite®, andconcentrated to give(2-(1-isopropyl-1H-pyrazol-5-yl)pyridin-3-yl)methanol as a brown oil.

Step 2:

A suitably equipped reactor was charged with(2-(1-isopropyl-1H-pyrazol-5-yl)pyridin-3-yl)methanol hydrochloride salt(1 equivalent) and purified water. An aqueous sodium bicarbonatesolution (8% NaHCO₃) was added slowly to maintain the solutiontemperature between 17° C. to 25° C. After addition was complete, thereaction mixture was stirred at 17° C. to 25° C. and dichloromethane wasadded and the organic layer was separated. DCM solution was thendistilled under atmospheric conditions at approximately 40° C. and thevolume was reduced. DCM was added the reactor and the contents of thereactor are stirred at 20° C. to 30° C. until a clear solution isformed. The contents of the reactor were cooled to 0° C. to 50° C. andthionyl chloride was charged to the reactor slowly to maintain atemperature of <5° C. The reaction solution was stirred at 17° C. to 25°C. When the reaction was complete, a solution of HCl (g) in 1,4-dioxane(ca. 4 N, 0.8 equiv.) was charged to the reactor slowly to maintain thesolution temperature between 17° C. and 25° C. The product3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine dihydrochloridesalt was filtered washed with dichloromethane and dried.

Example 3 Synthesis of2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehydeForm I

A suitably equipped reactor was charged with3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine dihydrochloridesalt (1 equivalent), sodium iodide (0.05 equivalent), sodium bicarbonate(4 equivalent), 1-methyl-2-pyrrolidinone (NMP), and2,6-dihydroxybenzaldehyde (1 to 1.05 equiv.). The reaction mixture washeated slowly to 40° C. to 50° C. and stirred until the reaction wascomplete. Water was then added and the reaction mixture was cooled andmaintained at 17° C. to 25° C. When the water addition was complete, thereaction mixture was stirred at 17° C. to 25° C. and slowly cooled to 0°C. to 50° C. and the resulting solids were collected by filtration. Thesolids were washed with a 0° C. to 5° C. 2:1 water/NMP solution,followed by 0° C. to 5° C. water. The solids were filtered and dried togive2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehydeas Form I or a mixture of2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehydeas Form I Form I and NMP solvates.

Alternative Synthesis:

A suitably equipped reactor was charged with3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridinebishydrochloride salt (1 equivalent), sodium iodide (0.05 equivalent),sodium bicarbonate (3 to 4 equivalent), 1-methyl-2-pyrrolidinone (7equivalent, NMP), and 2,6-dihydoxybenzaldehyde (1.05 equivalent). Thereaction mixture was heated to 40° C. to 50° C. and stirred until thereaction was complete. Water (5 equivalent) was then added whilemaintaining the contents of the reactor at 40° C. to 46° C. and theresulting clear solution seeded with2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehydeForm I. Additional water (5 equivalent) was added while maintaining thecontents of the reactor at 40° C. to 50° C., the reactor contents cooledto 15° C. to 25° C., and the reactor contents stirred for at least 1hour at 15° C. to 25° C. The solids were collected, washed twice with1:2 NMP:water and twice with water, and dried to yield2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehydeForm I devoid of2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehydeas NMP solvates.

Example 4 Preparation of2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)-benzaldehydeForm II

Step 1:

A suitably equipped reactor with an inert atmosphere was charged withcrude2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde(from Example 3 above) and MTBE and the contents stirred at 17° C. to25° C. until dissolution was achieved. The reaction solution was passedthrough a 0.45 micron filter and MTBE solvent volume reduced usingvacuum distillation at approximately 50° C. The concentrated solutionwas heated to 55° C. to 60° C. to dissolve any crystallized product.When a clear solution was obtained, the solution was cooled to 50° C. to55° C. and n-heptane was added.2-Hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde(e.g., Form II) seeds in a slurry of n-heptane were charged and thesolution was stirred at 50° C. to 55° C. The solution was cooled to 45°C. to 50° C. and n-heptane was added to the reactor slowly whilemaintaining a reaction solution temperature of 45° C. to 50° C. Thereaction solution are stirred at 45° C. to 50° C. and then slowly cooledto 17° C. to 25° C. A sample was taken for FTIR analysis and thecrystallization was considered complete when FTIR analysis confirmed2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)-benzaldehyde(Form II). The contents of the reactor were then cooled to 0° C. to 5°C. and the solids were isolated and washed with cold n-heptane anddried.

What is claimed is:
 1. A process of synthesizing Compound (I):

the process comprising: Step (i): treating a compound of formula (2):

wherein each R is —CH(CH₂R¹)—OR² or tetrahydropyran-2-yl optionallysubstituted with one, two, or three alkyl; and wherein R¹ is hydrogen oralkyl, and R² is alkyl; with an acid to provide compound (1):

Step (ii): reacting compound (1) with a compound of formula (3):

wherein LG is a leaving group under alkylation reacting conditions toprovide Compound (I); and Step (iii): optionally crystallizing Compound(I) from Step (ii) from heptane and methyl tert-butyl ether at 45°+/−5°C. to 55°+/−5° C.
 2. The process of claim 1 further comprisingformylating a compound of formula (4):

to provide the compound of formula (2):

wherein each R in compound of formulae (2) and (4) is —CH(CH₂R¹)—OR² ortetrahydropyran-2-yl optionally substituted with one, two, or threealkyl; and R¹ is hydrogen or alkyl, and R² is alkyl.
 3. The process ofclaim 2 further comprising reacting compound (5):

with a vinyl ether of formula CHR¹═CHOR² (wherein R¹ is hydrogen oralkyl and R² is alkyl), or 3,4-dihydro-2H-pyran optionally substitutedwith one, two or three alkyl, in the presence of a weak acid to providethe compound of formula (4):

wherein each R is —CH(CH₂R¹)—OR² (where R¹ is hydrogen or alkyl and R²is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two,or three alkyl.
 4. The process of claim 3 wherein compound (4) preparedaccording to claim 3 is treated in situ with a formylating agent toprovide compound (2).
 5. The process of claim 4 wherein compound (2)prepared according to claim 2 is treated in situ with an acid to providecompound (1).
 6. The process of claim 1 wherein Compound (I) iscrystallized from heptane and methyl tert-butyl ether at 45°+/−5° C. to55+/−5° C. to give Compound (I) in substantially pure Form IIcharacterized by a XRPD pattern comprising a X-ray powder diffractionpeak (Cu Kα radiation) at one or more of 13.37°, 14.37°, 19.95° or23.92±0.2° 2θ.
 7. The process of claim 4 wherein Compound (I) iscrystallized from heptane and methyl tert-butyl ether at 45°+/−5° C. to55+/−5° C. to give Compound (I) in substantially pure Form IIcharacterized by a XRPD pattern comprising a X-ray powder diffractionpeak (Cu Kα radiation) at one or more of 13.37°, 14.37°, 19.95° or23.92±0.2° 2θ.
 8. The process of claim 5 wherein Compound (I) iscrystallized from heptane and methyl tert-butyl ether at 45θ+/−5° C. to55+/−5° C. to give Compound (I) in substantially pure Form IIcharacterized by a XRPD pattern comprising a X-ray powder diffractionpeak (Cu Kα radiation) at one or more of 13.37°, 14.37°, 19.95° or23.92±0.2° 2θ.9.
 9. The process of claim 6 wherein Compound (I) iscrystallized at 45° C. to 55° C. to give Compound (I) wherein at least95% by wt of Compound (I) is Form II.
 10. The process of claim 7 whereinCompound (I) is crystallized at 45° C. to 55° C. to give Compound (I)wherein at least 95% by wt of Compound (I) is Form II.
 11. The processof claim 8 wherein Compound (I) is crystallized at 45° C. to 55° C. togive Compound (I) wherein at least 95% by wt of Compound (I) is Form II.12. The process of claim 1 wherein R is —CH(CH₃)—O—CH₂CH₃ and the acidfor removal of the R groups is an inorganic acid.
 13. The process ofclaim 1 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 14. The process ofclaim 3 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 15. The process ofclaim 4 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 16. The process ofclaim 5 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 17. The process ofclaim 6 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 18. The process ofclaim 7 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 19. The process ofclaim 8 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 20. The process ofclaim 9 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 21. The process ofclaim 10 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 22. The process ofclaim 11 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI.
 23. The process ofclaim 1 wherein R is —CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI and Compound (I) iscrystallized from the reaction mixture by addition of water at 40° C. to50° C. to give substantially pure Form I characterized by a XRPD patterncomprising a X-ray powder diffraction peak (Cu Kα radiation) at one ormore of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and26.44°±0.2° 2θ.
 24. The process of claim 4 wherein R is—CH(CH₃)—O—CH₂CH₃, LG is chloro and the alkylation reaction is carriedout in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonateand a catalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 25. The process of claim 5 wherein R is —CH(CH₃)—O—CH₂CH₃, LG ischloro and the alkylation reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 26. The process of claim 6 wherein R is —CH(CH₃)—O—CH₂CH₃, LG ischloro and the alkylation reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 27. The process of claim 7 wherein R is —CH(CH₃)—O—CH₂CH₃, LG ischloro and the alkylation reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 28. The process of claim 8 wherein R is —CH(CH₃)—O—CH₂CH₃, LG ischloro and the alkylation reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 29. The process of claim 9 wherein R is —CH(CH₃)—O—CH₂CH₃, LG ischloro and the alkylation reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 30. The process of claim 10 wherein R is —CH(CH₃)—O—CH₂CH₃, LG ischloro and the alkylation reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 31. The process of claim 11 wherein R is —CH(CH₃)—O—CH₂CH₃, LG ischloro and the alkylation reaction is carried out inN-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 50° C. to givesubstantially pure Form I characterized by a XRPD pattern comprising aX-ray powder diffraction peak (Cu Kα radiation) at one or more of12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
 32. The process of claim 1 wherein R is —CH(CH₃)—O—CH₂CH₃, the acidfor the removal of R group is hydrochloric acid, LG is chloro and thealkylation reaction is carried out in N-methyl-2-pyrrolidinone in thepresence of sodium bicarbonate and a catalytic amount of NaI andCompound (I) is crystallized from the reaction mixture by addition ofwater at 40° C. to 46° C. to give Compound (I) that at least 95% byweight Form I characterized by a XRPD pattern comprising a X-ray powderdiffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°,16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2° 2θ.
 33. Theprocess of claim 4 wherein R is —CH(CH₃)—O—CH₂CH₃, the acid for theremoval of R group is hydrochloric acid, LG is chloro and the alkylationreaction is carried out in N-methyl-2-pyrrolidinone in the presence ofsodium bicarbonate and a catalytic amount of NaI and Compound (I) iscrystallized from the reaction mixture by addition of water at 40° C. to46° C. to give Compound (I) that at least 95% by weight Form Icharacterized by a XRPD pattern comprising a X-ray powder diffractionpeak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°,17.60°, 25.14°, 25.82° and 26.44°±0.2° 2θ.
 34. The process of claim 5wherein R is —CH(CH₃)—O—CH₂CH₃, the acid for the removal of R group ishydrochloric acid, LG is chloro and the alkylation reaction is carriedout in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonateand a catalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 46° C. to giveCompound (I) that at least 95% by weight Form I characterized by a XRPDpattern comprising a X-ray powder diffraction peak (Cu Kα radiation) atone or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82°and 26.44°±0.2° 2θ.
 35. The process of claim 7 wherein R is—CH(CH₃)—O—CH₂CH₃, the acid for the removal of R group is hydrochloricacid, the weak acid is pyridinium tosylate, the formylating agent isn-BuLi and DMF, LG is chloro and the alkylation reaction is carried outin N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 46° C. to giveCompound (I) that at least 95% by weight Form I characterized by a XRPDpattern comprising a X-ray powder diffraction peak (Cu Kα radiation) atone or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82°and 26.44°±0.2° 2θ.
 36. The process of claim 8 wherein R is—CH(CH₃)—O—CH₂CH₃, the acid for the removal of R group is hydrochloricacid, the weak acid is pyridinium tosylate, the formylating agent isn-BuLi and DMF, LG is chloro and the alkylation reaction is carried outin N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and acatalytic amount of NaI and Compound (I) is crystallized from thereaction mixture by addition of water at 40° C. to 46° C. to giveCompound (I) that at least 95% by weight Form I characterized by a XRPDpattern comprising a X-ray powder diffraction peak (Cu Kα radiation) atone or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82°and 26.44°±0.2° 2θ.
 37. An intermediate of formula (2):

wherein each R is —CH(CH₂R¹)OR²; and wherein R¹ is hydrogen or alkyl,and R² is alkyl.